ASML’s 5×5 e-beam metrology system makes debut

An ASML customer has installed the first HMI eScan 1100 multibeam e-beam wafer inspection system. Armed with 25 beams in a 5 by 5 configuration, the eScan 1100 is able to increase throughput up 15 times compared to single-beam systems, enabling defect monitoring in high-volume manufacturing environments, ASML subsidiary HMI claims.

ASML acquired metrology specialist HMI in 2016 to capitalize on a two-way synergy between the two companies. On the one hand e-beam inspection expands the capabilities of ASML’s holistic lithography suite because, because it’s easier to produce low-wavelength electrons than photons. And on the other hand, information from the suite speeds up inspection by directing e-beams to suspected hot-spots, decreasing the wafer area that needs to be scanned.

The collaboration had a bit of a slow start, however, after the partners had to start over because of an IP issue. Delayed by a year-and-a-half, the first tool, the 3×3 beam eScan 1000, was shipped in May 2020. This “technology demonstrator yielded strong application learnings and design improvements,” says Gary Zhang, Head of Product Marketing at HMI.