Nearfield and Imec join hands in 3D semiconductor metrology

Nearfield Instruments has entered into a strategic development project with Imec. As part of the multi-year collaboration, the Rotterdam-based metrology equipment manufacturer will deploy its flagship system, the Quadra, at the research institute’s facility in Leuven. The two organizations will jointly develop next-generation metrology solutions to address critical challenges across the semiconductor manufacturing value chain, including high-NA EUV resist 3D metrology, 3D profiling of CFET logic devices and 3D heterogeneous integration metrology.

“Partnering with Imec allows us to push the boundaries of what’s possible in semiconductor manufacturing process control,” says Nearfield CEO Hamed Sadeghian. Luc Van den hove, CEO of Imec, adds: “We’re paving the way for transformative advancements that will support the future of chip manufacturing and enable the continued progress of the digital era. We’re happy to see European initiatives to develop advanced equipment solutions addressing some of the pressing needs and want to leverage our pilot line to demonstrate some of these capabilities.”