Elon Musk’s Terafab is expected to receive its first ASML EUV lithography system in mid-2027, according to journalist Tim Culpan, citing sources familiar with the matter. The scanner could arrive before the research fab near Austin is ready to accommodate it. Semianalysis expects equipment installation to begin later that year.
The reported delivery suggests Terafab will initially use conventional EUV equipment despite Musk’s public enthusiasm for free-electron laser light sources. Introducing an alternative light source would likely add too much process development and equipment qualification work.
Separately, Terafab’s planned volume-production site is being developed in Grimes County, Texas. Semianalysis forecasts that the first phase will begin operating in late 2029 and reach volume production by mid-2030. The fab reportedly plans to adopt Intel’s 14A process.
