Chinese startup Langdao Silex has presented a prototype EUV light source with a claimed output exceeding 15 watts. Founded in 2024 by alumni of Tsinghua University’s Gas Discharge Plasma Laboratory, the company uses laser-produced plasma, the same basic approach employed in ASML’s EUV sources. Langdao says 90 percent of the prototype’s components are domestically sourced.
The company claims continuous operation exceeding 100 hours, but didn’t demonstrate the source running at the China International Industry Fair in Shanghai, where it was exhibited. It also hasn’t disclosed where the output power is measured. That prevents a direct comparison with ASML’s sources, whose usable power is measured at intermediate focus, after collection losses.
The prototype could support research into EUV resists, optics and experimental exposure systems, but its output is far below what’s needed for commercial chip production. ASML’s first source that enabled high-volume manufacturing produced 250 watts. Langdao is developing a higher-power source and reportedly expects commercialization to take another three to five years.
