Atomic masonry for EUV

The industrial focus group for XUV optics in Twente is investigating the interaction of extreme ultraviolet light with nanostructures. The goal is to refine the recipe book for conditioning and manipulating EUV lithography. “ASML and Zeiss haven’t yet defined a hyper-NA project, but the toolbox for even higher numerical apertures is already pretty well filled,” says professor Marcelo Ackermann.

René Raaijmakers

This article is exclusively available to premium members of Bits&Chips. Already a premium member? Please log in. Not yet a premium member? Become one for only €15 and enjoy all the benefits.

Login

Become a premium member for only €15