Report: SK Hynix to double EUV capacity with 20 new units in two years

SK Hynix plans to acquire approximately twenty additional EUV lithography machines by 2027, according to Korean tech site ET News. The move effectively doubles the memory maker’s current fleet (including R&D units). These additions will be deployed across its Cheongju M15X and Icheon M16 fabs, supporting its push into next‑generation DRAM and high-bandwidth memory (HBM) production.

At last year’s Investor Day, ASML projected a 15-25 percent CAGR spending increase on EUV tools for DRAM manufacturing, driven by an accelerating 22 percent CAGR bit growth (up from 18 percent in 2015-2023) and by an increasing number of EUV exposures per die (from 5 in 2025 to 7-10 in 2030, less if high-NA is deployed). SK Hynix figured prominently at the event, with CTO Kwak Noh-Jung testifying in a video message that EUV plays an important part in the firm’s roadmap.

Earlier in September, SK Hynix announced the installation of the world’s first high-NA EUV scanner intended for high-volume production, the Twinscan EXE:5200B.