Achtergrond

‘We’ve shown that the impossible is possible’

Paul van Gerven
Reading time: 3 minutes

To reassure its most important customers, ASML developed a membrane that protects EUV masks from microscopic debris.

There’s one misunderstanding that Dan Smith at ASML wants to clear up for once and for all: the pellicle, a protective membrane for the mask, isn’t necessary for EUV lithography. ‘Our machines are extremely clean and particles can’t move around easily in a vacuum. Our data reveal that the mask picks up most of the particles outside the machine,’ says the director of product management. ASML nonetheless began developing an EUV pellicle, because several customers asked for it. ‘Our customers see it as an insurance policy. If something goes wrong during production, the mask is protected.’

Most likely it’s the foundries who will sleep more soundly knowing there’s a pellicle available. Compared with memory manufacturers, they conduct far more and more varied production runs, which increases the chance of a mishap. Once a memory manufacturer has started up its process, it can essentially rest easy.

This article is exclusively available to premium members of Bits&Chips. Already a premium member? Please log in. Not yet a premium member? Become one for only €15 and enjoy all the benefits.

Login

Related content