Imec has started the installation of ASML’s high-NA EUV lithography system in its Leuven 300mm cleanroom. It will offer the institute’s global partner ecosystem access to the enhanced patterning capabilities needed to develop (and ultimately manufacture) sub-2nm logic and high-density memory.
The installation is part of a five-year strategic partnership between Imec and ASML, supported by European and national funding programs, including the Chips Joint Undertaking and IPCEI. The tool will also play a central role in the NanoIC pilot line, aimed at strengthening Europe’s position in semiconductor R&D.
When the first generation of EUV was introduced, Imec received one of the first tools. For high-NA, the first tool stayed at ASML’s headquarters in a lab jointly run by ASML and Imec. This gave the industry a head start on high-NA research and process development.
Once the new tool at Imec has been installed, the Veldhoven lab will be phased out. An ASML spokesperson told Bits&Chips that no decision has been made about the fate of the system there. Options include upgrading for sale, reusing modules in other systems or using as a testbed for further development.
Imec expects the system in Leuven to be fully qualified by the fourth quarter of 2026.
