Alixlabs has unveiled a beta tool for atomic pitch splitting (APS), a non-lithographic patterning step based on atomic layer etching. Taking the first commercial step with the Sax Forma system, the Lund-based company is positioning the platform for customer evaluation, process integration and production-like validation. A follow-up gamma version has been planned for 2028.
APS is designed as a patterning step that’s complementary to DUV, EUV and nanoimprint lithography flows. It enables the doubling or even quadrupling of feature density without additional lithography steps. The process builds on precise, layer-by-layer material removal, allowing high control and reduced defectivity compared to conventional multi-patterning approaches. According to Alixlabs, APS will lower capital expenditure, shorten cycle times and improve throughput.
Industrialization of Sax Forma is being carried out with VDL ETG Projects, which is supporting system integration and manufacturing scale-up.
