Delft-based Delmic has unveiled Sparc 3.0, a measurement system for electron microscopes, at the International Microscopy Congress in Liverpool. The system can automate specialist operations and is designed to work faster than existing alternatives.
Electron microscopes rely on cathodoluminescence techniques, in which materials are bombarded with electrons, causing them to emit light that can then be analyzed. The systems can examine materials down to the nanoscale to detect defects in semiconductors and chips, for example. As they typically require experienced operators, even small differences in how they’re handled can affect measurement results. Sparc 3.0 intends to eliminate these deviations by automating tasks like alignment and calibration, and letting users save their settings for future use.
According to Delft University of Technology spinoff Delmic, the system can also take more measurements per hour than current systems and scan multiple areas automatically in sequence, further reducing the need for operator involvement. An upgrade will allow comparisons of how materials respond to both electron and light irradiation. This feature would be valuable for research into new solar cell materials, quantum technology materials and certain semiconductors.
