ASML has entered into a strategic partnership for TNO’s Photonic Chip Pilot Line. Under the agreement, the litho giant will use i-line and DUV lithography equipment within this facility for shared R&D and joint development with TNO as well as for customer demonstrations. It’s unclear whether money changes hands as part of the deal, as the parties haven’t disclosed financial details.
Once operational, the pilot line will enable production of indium phosphide photonic chips on 6-inch wafers, a scale considered essential for industrial adoption. The initiative complements ongoing efforts within the Photonic Integration Technology Centre, where TNO, Eindhoven University of Technology and the University of Twente collaborate to translate photonic research into commercial applications.
“Scaling photonic chip technology requires a seamless transition from cutting-edge research to high-volume manufacturing. By integrating our lithography systems into TNO’s pilot line, we’re bridging that gap. This collaboration gives us the ideal environment to optimize our processes for integrated photonics, ultimately accelerating the time-to-market for this transformative technology,” comments Stanislas Baron, senior vice president at ASML.
