ASML has shipped its first EXE:5200B, the high-NA EUV scanner designed to support high-volume semiconductor manufacturing. It’s the sixth high-NA tool to be completed, following the installation of five EXE:5000 R&D scanners at Intel (2 tools), TSMC and Samsung and in the joint ASML-Imec High-NA Lab in Veldhoven. The EXE:5200B offers a 60 percent productivity boost over its predecessor, achieving a throughput of 175 wafers per hour.
The latest tool is currently being installed, almost certainly at Intel, which signed the first EXE:5200 purchase order in 2022. The firm is somewhat ambiguous about high-NA adoption in production, having confirmed deployment for 14A manufacturing in 2027-2028 while also offering a 0.33-NA-only option that doesn’t require a change in IC design.
CFO Roger Dassen mentioned to analysts that ASML will recognize more high-NA revenue in the second half of this year than in the first half. Having entered only one tool in the books in H1, at least two more will follow in H2. ASML has shipped six high-NA scanners so far, but recognized revenue for three of them.
