The Dutch government is expanding semiconductor export controls to include metrology and inspection equipment. In a new rule effective 1 April, a license will be required to export both optical and e-beam systems designed to find defects that measure 21 nanometers and below. For reference, at the recent Investor Day, ASML explained that current leading-edge semiconductor manufacturing deals with defects below 10 nanometers. ASML offers both optical and e-beam inspection equipment.
The Dutch rule change follows an update announced by the US on 2 December 2024. At the time, ASML said that “long-term, our scenarios for demand in the semiconductor industry aren’t expected to be impacted by the new regulations.” A spokesperson told Bits&Chips that “no additional impact” is expected from the Dutch implementation.
Nearfield Instruments appears to be unaffected by the revision, as atomic force technology isn’t mentioned in the new restrictions.
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