EVG’s second-generation maskless litho platform is five times faster

Business development manager Ksenija Varga doesn’t want to give the full specifications of the high-speed maskless lithography system EV Group will launch in the fall. However, she does stress that it will be five times faster than the current Lithoscale machine that has been on the market since 2020.

The first-generation Lithoscale was positioned primarily in semiconductor testing, advanced packaging, advanced imaging and security markets. “The new tool will address additional markets and applications and is set to establish the technology more firmly in the high-volume manufacturing field,” says Varga. The wafer stage that will drive the higher throughput is an in-house development.