The University of Groningen (UG) and ASML have signed a new framework agreement to intensify their research collaboration. Inked 5 December 2025 at the litho giant’s headquarters in Veldhoven, the accord paves the way for joint projects in advanced materials, fluid flow processes, special coatings and advanced control systems.
The agreement builds on years of prior collaboration, particularly through the Advanced Research Center for Nanolithography (ARCNL) and the use of the UG’s Zernike-LEIF ion-beam facility. Under the new framework, both parties aim to accelerate the launch of new R&D initiatives, for example exploring even finer chip patterning using shorter-wavelength light.
The collaboration aligns with the Beethoven national strategy to cultivate semiconductor talent. The northern region previously had to swallow the fact that it received only seven percent of the Beethoven budget.
